Ion Implanting

Used to alter the electrical properties of a silicon substrates, ion implantation is a low-temperature process that accelerates ions into the target. The success of ion implantation processes is heavily dependent on the quality of the vacuum within ion implanters – and the vacuum valves that control and isolate the high vacuum environment.

For optimal isolation and control of vacuum conditions in ion implanters, vacuum valves are needed that allow precise control while exhibiting physically neutral behavior in the process.

To find out more about how a VAT vacuum valve solution can help to address ion implantation process issues, please select from the products listed below.

02.4 - Large Transfer Valve with MONOVAT

SEMICON/FPD China 2025

VAT media release on full-year 2024 results

Silicon carbide: An exclusive: semiconductors on the move to mainstream

VAT Media Release on Q4 and FY 2024 Preliminary Results

Ion Implanting

Large Transfer Valve with MONOVAT

Large Transfer Door Insert with L-VAT

Gate Valve

HV Angle Valve

HV Inline Valve

HV Angle Valve with Soft-Pump Function

Edge Welded Metal Bellows

Flange Connections and Seals